Artifactory repositories consist of local, remote, and virtual types, each serving distinct roles in managing artifacts, with local repositories storing in-house artifacts, remote repositories proxying and caching external resources, and virtual repositories aggregating both under a single URL. Effective security management is crucial to prevent the infiltration of malicious artifacts, necessitating control over what is downloaded and uploaded. Include and exclude patterns, defined using wildcard text, are instrumental in this process, ensuring that artifacts are only uploaded or downloaded if they match specified include patterns and do not match exclude patterns. These patterns help in mitigating security risks, such as accidental exposure of sensitive information through queries logged at remote resources, and enhance performance by reducing unnecessary network requests. Exclude patterns can also restrict outdated dependency versions, while include patterns ensure repository organization by limiting the types of artifacts hosted. By customizing these patterns, organizations achieve enhanced security and operational efficiency.